本實驗室運用數位光源處理技術(DLP)建立無光罩式光點陣列斜掃描曝光系統並探討其微影製程的性能；此系統主要由準分子雷射製作出系統的核心元件微透鏡/空間濾波器陣列(MLSFA)、自行建構的點陣列斜掃描演算法及光投影系統而建構成。點陣列斜掃描法係利用MLSFA將數位光學影像轉換成光點陣列並沿著一個軸向拖拉掃描來完成大面積圖案化曝光。無實體光罩非常合適傳統黃光微影的相關產業，有助減少研發的時間與成本，且在少量多樣化發展上擁有相當大的優勢。目前最小線寬可達5 μm並透過任意傾斜角度來調整線寬解析度到0.3 μm。
The Mask-less Dot Scanning Lithography system is based on digital light processing, DLP, technique to advance a novel lithography method for time-saving and cost-down rather than the conventional lithography method. The construction of system has three core subjects, fabrication of Microlens/ Spatial Filter Array (MLSFA) by Excimer laser micromachining, programming the algorithm of dot array scanning, and composing the optical projection system. The main idea of this study is using the MLSFA to transform digital light image into light dot pattern and yawing angle, dragging one way. The major advantage of mask-less is appropriate for manufacturer saving time and cost in development. In addition, it is suitable to produce in small amount of diversity. In recently, the minimum line width is around 5 μm, and the resolution of line width would be around 0.3 μm by yawing angle.