奈米 Nano-Structure
軟性光罩微影技術 Soft Photo-mask Lithography軟性光罩微影製程是以黃光微影製程技術的概念結合奈米壓印的特點（包括：大面積、可撓性的䩞附、一次性的曝光製程、小線寬等優點）而延伸出的另一項新技術，此技術克服奈米壓印中UV膠蝕刻選擇比、殘留層均勻度、壓印產率等問題。本研究之軟性光罩微影技術，目前主要應用為4吋與6吋的圖案畫藍寶石基板製作，可完成週期3um、2um以及1um的圖案畫藍寶石基板，後續產品應用如中介層、透明導電膜、太陽能等應用。
The new method of soft photo-mask lithography (SPL) is based on photolithography Process combined with characteristics of nanoimprinting lithography. The SPL can resolve the problems of nanoimprinding, including etching selectivity, uniformity of residule layer, throughtput, and so on.
In our experiment , both 4 and 6 inch patterned sapphire substrates (PSSs) with miro and nanometer feature size are successfully achieved. Other possible applications of SPL are interposer, metal mash, and solar energy devises
其他相關研究主軸
Other Researches
- 聲波感測元件與材料之非破壞檢測 (Acoustic Sensing Device and Non-destructive Evaluation)
- 半導體靶材缺陷之超音波影像 (Target Material Ultrasound Image Defect Inspection)
- 聲子晶體結構中的波傳效應 (Wave propagation in Phononic crystal structure)
- 準分子雷射微細加工 (Excimer Laser Micro Machining)
- 無光罩式斜掃描曝光系統 (Mask-less Dot Scanning Lithography System)
- 無光罩式外滾筒微影製成技術 (Mask-less Outer Cylindrical Photolithography)
- 壓電膜製作技術 (Technique of Fabricating Piezoelectric Film)
- 軟性光罩微影技術 (Soft Photo-mask Lithography)
- 平面奈米壓印 (Flat Nano-Imprinting)
- 奈米壓印 (Nano-Imprinting)
- 滾輪壓印 (Nano-Imprinting)
- 內滾筒微影製程技術 (Inner cylindrical Photolithography)
- 機械設備研發製作 (Research And Fabrication of Machines)