光 Light
準分子雷射微細加工 Excimer Laser Micro Machining本實驗室的準分子雷射微加工系統由三部分建構而成,分別為雷射光源,光學透鏡系統和精密控制位移伺服平台。其加工方法和特點分為三個部分。一、雙軸拖拉法,可加工大面積且周期性微透鏡陣列,二、旋轉加工法,適合加工微噴嘴和微擴散器,三、孔洞面積法,乃利用光罩透光率分佈不同而製作出所期望的結構。利用雙軸拖拉法加工大面積微透鏡陣列,搭配平行紫外光和位移平台,將紫外光光束聚焦進行黃光微影製成。
Excimer laser micro machining system in our lab includes three components are laser source, optical lens system and precise controlled moving stages. In our research can be divided into three approaches and features. First is Laser Dragging Process which is good at machining big area and periodic micro-lens array. Second is Laser Rotating Process which feature is fabricating nozzles and diffusers. Third is Hole Area Modulation based on the different spatial distribution of projected laser energy intensity to fabricate design surface profile. Using the Laser Dragging Process to get micro-lens array. With the parallel UV light source and precise controlled moving stage, focus the UV light into a spot size and do lithography on photoresist.
其他相關研究主軸
Other Researches
- 聲波感測元件與材料之非破壞檢測 (Acoustic Sensing Device and Non-destructive Evaluation)
- 半導體靶材缺陷之超音波影像 (Target Material Ultrasound Image Defect Inspection)
- 聲子晶體結構中的波傳效應 (Wave propagation in Phononic crystal structure)
- 準分子雷射微細加工 (Excimer Laser Micro Machining)
- 無光罩式斜掃描曝光系統 (Mask-less Dot Scanning Lithography System)
- 無光罩式外滾筒微影製成技術 (Mask-less Outer Cylindrical Photolithography)
- 壓電膜製作技術 (Technique of Fabricating Piezoelectric Film)
- 軟性光罩微影技術 (Soft Photo-mask Lithography)
- 平面奈米壓印 (Flat Nano-Imprinting)
- 奈米壓印 (Nano-Imprinting)
- 滾輪壓印 (Nano-Imprinting)
- 內滾筒微影製程技術 (Inner cylindrical Photolithography)
- 機械設備研發製作 (Research And Fabrication of Machines)